M.Sc. Chia-wei Chen
- Wissenschaftlicher Mitarbeiter
- Tel.: +49 721 6091-590
- chia-wei chen ∂does-not-exist.iosb fraunhofer de
Karlsruher Institut für Technologie – KIT
Lehrstuhl für Interaktive Echtzeitsysteme (IES)
Prof. Dr.- Ing. Jürgen Beyerer
c/o Technologiefabrik
Haid-und-Neu-Str. 7
76131 Karlsruhe
Lebenslauf
Chia-Wei Chen is a scientific staff at Vision and Fusion Laboratory (IES), Karlsruhe Institute of Technology(KIT). He is working on retroreflex ellipsometry inclose collaboration with Vision Based Inspection Systems (SPR) at Fraunhofer Institute of Optronics, System Technologies and Image Exploitation IOSB in arlsruhe, Germany. His research interests include ellipsometry, opticaldesign, and precision metrology.
Veröffentlichungen
2024
Retroreflex Ellipsometry for Nonplanar Surfaces. Dissertation
Chen, C.-W.
2024, November 5. Karlsruher Institut für Technologie (KIT). doi:10.5445/IR/1000175712
Chen, C.-W.
2024, November 5. Karlsruher Institut für Technologie (KIT). doi:10.5445/IR/1000175712
2023
Retroreflex ellipsometry for isotropic three-phase systems with nonplanar surfaces
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2023. Thin Solid Films, 769, Art.-Nr.: 139732. doi:10.1016/j.tsf.2023.139732
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2023. Thin Solid Films, 769, Art.-Nr.: 139732. doi:10.1016/j.tsf.2023.139732
Sensitivity enhanced glucose sensing by return-path Mueller matrix ellipsometry
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2023. OCM 2023, Optical Characterization of Materials. Conference Proceedings, 119 – 128, KIT Scientific Publishing
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2023. OCM 2023, Optical Characterization of Materials. Conference Proceedings, 119 – 128, KIT Scientific Publishing
2021
Sensitivity enhanced roll-angle sensor by means of a quarter-waveplate
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2021. Technisches Messen, 88 (s1), s48–s52. doi:10.1515/teme-2021-0069
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2021. Technisches Messen, 88 (s1), s48–s52. doi:10.1515/teme-2021-0069
Analytical determination of the complex refractive index and the incident angle of an optically isotropic substrate by ellipsometric parameters and reflectance
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2021. Applied optics, 60 (22), F33–F38. doi:10.1364/AO.423793
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2021. Applied optics, 60 (22), F33–F38. doi:10.1364/AO.423793
Robustness estimation of simple lens systems by machine learning
Chen, C.-W.; Zhou, B.; Längle, T.; Beyerer, J.
2021. International Optical Design Conference: in Proceedings OSA Optical Design and Fabrication 2021 (Flat Optics, Freeform, IODC, OFT) ; 27 June–1 July 2021, Washington, DC, United States, Art.-Nr.: 120781B, Optica Publishing Group (OSA). doi:10.1117/12.2603658
Chen, C.-W.; Zhou, B.; Längle, T.; Beyerer, J.
2021. International Optical Design Conference: in Proceedings OSA Optical Design and Fabrication 2021 (Flat Optics, Freeform, IODC, OFT) ; 27 June–1 July 2021, Washington, DC, United States, Art.-Nr.: 120781B, Optica Publishing Group (OSA). doi:10.1117/12.2603658
Characterization of Mueller matrices in retroreflexellipsometry
Chen, C.-W.
2021. Proceedings of the 2020 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics, Vision and Fusion Laboratory. Ed.: J. Beyerer; T. Zander, 19–32, KIT Scientific Publishing. doi:10.5445/IR/1000135071
Chen, C.-W.
2021. Proceedings of the 2020 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics, Vision and Fusion Laboratory. Ed.: J. Beyerer; T. Zander, 19–32, KIT Scientific Publishing. doi:10.5445/IR/1000135071
2020
Ellipsometric inline inspection of dielectric substrates with nonplanar surfaces
Hartrumpf, M.; Chen, C.-W.; Längle, T.; Beyerer, J.
2020. Technisches Messen, 87 (6), 6. doi:10.1515/teme-2019-0097
Hartrumpf, M.; Chen, C.-W.; Längle, T.; Beyerer, J.
2020. Technisches Messen, 87 (6), 6. doi:10.1515/teme-2019-0097
2019
Measurement of ellipsometric data and surface orientations by modulated circular polarized light / Messung von ellipsometrischen Daten und Oberflächenorientierungen durch moduliertes zirkular polarisiertes Licht
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2019. Technisches Messen, 86 (s1), 32–36. doi:10.1515/teme-2019-0047
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2019. Technisches Messen, 86 (s1), 32–36. doi:10.1515/teme-2019-0047
An Overview of Ellipsometric Measurements for Nonplanar Surfaces
Chen, C.-W.
2019. Proceedings of the 2019 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics, Vision and Fusion Laboratory. Ed.: J. Beyerer; T. Zander, 25–38, KIT Scientific Publishing
Chen, C.-W.
2019. Proceedings of the 2019 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics, Vision and Fusion Laboratory. Ed.: J. Beyerer; T. Zander, 25–38, KIT Scientific Publishing
Retroreflex ellipsometry for isotropic substrates with nonplanar surfaces
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2019. Journal of vacuum science & technology / B, 38 (1), 014005. doi:10.1116/1.5121854
Chen, C.-W.; Hartrumpf, M.; Längle, T.; Beyerer, J.
2019. Journal of vacuum science & technology / B, 38 (1), 014005. doi:10.1116/1.5121854
An Overview of Return-Path Ellipsometry
Chen, C.-W.
2019. Proceedings of the 2018 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics, Vision and Fusion Laboratory. Ed.: J. Beyerer, M. Taphanel, 1–10, KIT Scientific Publishing
Chen, C.-W.
2019. Proceedings of the 2018 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics, Vision and Fusion Laboratory. Ed.: J. Beyerer, M. Taphanel, 1–10, KIT Scientific Publishing